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Publikacje
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[38502] Artykuł:

Sensitivity of imaging properties of metal-dielectric layered flat lens to fabrication inaccuracies

Czasopismo: Opto-Electronics Review   Tom: 18, Zeszyt: 4, Strony: 446-457
ISSN:  1230-3402
Wydawca:  VERSITA, SOLIPSKA 14A-1, 02-482 WARSAW, POLAND
Opublikowano: Grudzień 2010
 
  Autorzy / Redaktorzy / Twórcy
Imię i nazwisko Wydział Katedra Procent
udziału
Liczba
punktów
R Kotyński13.00  
H Baghdasaryan13.00  
T Stefaniuk13.00  
A Pastuszczak13.00  
Marian MarciniakInstytut Łączności - Państwowy Instytut Badawczy13.00  
A Lavrinenko13.00  
K Panajotov13.00  
T Szoplik13.00  

Grupa MNiSW:  Publikacja w czasopismach wymienionych w wykazie ministra MNiSzW (część A)
Punkty MNiSW: 27
Klasyfikacja Web of Science: Article


DOI LogoDOI     Web of Science Logo Web of Science     Web of Science LogoYADDA/CEON    
Keywords:

plasmonics  nanophotonics  nano lenses  super-resolution  metal-dielectric multilayers 



Abstract:

We characterize the sensitivity of imaging properties of a layered silver-TiO₂ flat lens to fabrication inaccuracies. The lens is designed for approximately diffraction-free imaging with subwavelength resolution at distances in the order of a wavelength. Its operation may be attributed to self-collimation with a secondary role of Fabry-Perot resonant transmission, even though the first order effective medium description of the structure is inaccurate. Super-resolution is maintained for a broad range of overall thicknesses and the total thickness of the multilayer is limited by absorption. The tolerance analysis indicates that the resolution and transmission efficiency are highly sensitive to small changes of layer thicknesses.



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